Muestra la distribución de su producción desde 2008 por disciplinas.
Publicaciones WoS (Ediciones: ISSHP, ISTP, AHCI, SSCI, SCI), Scopus, SciELO Chile.
| Institución | Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada |
| WOS | #Pub |
|---|---|
| Physics, Fluids & Plasmas | 23 |
| Physics, Nuclear | 7 |
| Physics, Applied | 6 |
| Physics, Multidisciplinary | 4 |
| Materials Science, Multidisciplinary | 4 |
| Nuclear Science & Technology | 4 |
| Instruments & Instrumentation | 3 |
| Astronomy & Astrophysics | 2 |
| Physics, Particles & Fields | 2 |
| Nanoscience & Nanotechnology | 2 |
| Physiology | 1 |
| Biology | 1 |
| Engineering, Multidisciplinary | 1 |
| Optics | 1 |
| Scopus | #Pub |
|---|---|
| Physics And Astronomy (All) | 33 |
| Nuclear And High Energy Physics | 3 |
| Instrumentation | 2 |
| Physics And Astronomy (Miscellaneous) | 2 |
| Condensed Matter Physics | 1 |
| Nuclear Energy And Engineering | 1 |
| SciELO | #Pub |
|---|
| Publicaciones | Citas | ||||
|---|---|---|---|---|---|
| Total | Porcentaje | Total | Porcentaje | Representativas Cuartil (Mediana) | |
| Q1 | 7 | 20.6 % | 90 | 25.6 % | 12.0 |
| Q2 | 14 | 41.2 % | 188 | 53.6 % | 12 |
| Q3 | 9 | 26.5 % | 59 | 16.8 % | 4.0 |
| Q4 | 4 | 11.8 % | 14 | 4.0 % | 3.5 |