Muestra la distribución de disciplinas para esta publicación.
Publicaciones WoS (Ediciones: ISSHP, ISTP, AHCI, SSCI, SCI), Scopus, SciELO Chile.
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| DOI | |||||
| Año | 2009 | ||||
| Tipo | proceedings paper |
Citas Totales
Autores Afiliación Chile
Instituciones Chile
% Participación
Internacional
Autores
Afiliación Extranjera
Instituciones
Extranjeras
Fusion studies using plasma focus devices from tens of kilojoules to less than one joule performed at the Chilean Nuclear Energy Commission are presented. The similarity of the physical behavior and the scaling observed in these machines are emphasized. Experiments on actual devices show that scaling holds at least through six order of magnitude. In particular all of these devices, from the largest to the smallest, keep the same quantity of energy per particle. Therefore, fusion reactions are possible to be obtained in ultraminiature devices (driven by generators of 0.1J), as they are in the bigger devices (driven by generators of 1MJ). However, the stability of the plasma depends on the size and energy of the device.
| Ord. | Autor | Género | Institución - País |
|---|---|---|---|
| 1 | SOTO-NORAMBUENA, LEOPOLDO ALEJANDRO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 2 | PAVEZ-MORALES, CRISTIAN ARTURO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 3 | TARIFENO-SALDIVIA, ARIEL ESTEBAN | Hombre |
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile
Universidad de Concepción - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 4 | MORENO-MARTINEZ, JOSE ALBERTO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 5 | Cardenas, Miguel | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 6 | Hammer, DA | - | |
| 7 | Kusse, BR | - |
| Fuente |
|---|
| Bicentennial Program in Science and Technology |
| Center for Research and Applications in Plasma Physics and Pulsed Power |
| P4 |