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| DOI | 10.1088/1742-6596/591/1/012024 | ||||
| Año | 2015 | ||||
| Tipo | proceedings paper |
Citas Totales
Autores Afiliación Chile
Instituciones Chile
% Participación
Internacional
Autores
Afiliación Extranjera
Instituciones
Extranjeras
We present the study of the evolution of the ionization degree of the plasma sheath in a low energy plasma focus device with time and spatial resolution, by means of visible spectroscopy. The measurements were developed in the low energy plasma focus device PF-400J (176-539 J, 880 nF, 20-35 kV, quarter period similar to 300 ns) [1], using an ANDOR Shamrock 500i visible spectrometer with an ICCD that enabled the acquisition of spectra with time resolution in the order of tens of nanosecond. The use of a lens system improved spatial resolution, allowing the study of the plasma sheath in different stages of the discharge dynamic. In this work we present results from the pinch volume to study the evolution of the ionization degree of the plasma. The results include discharges in pure Hydrogen and a mixture of noble gases and Hydrogen, such as Neon and Helium, which were introduced in the discharge by small percentages ranging from 2 to 5%.
| Ord. | Autor | Género | Institución - País |
|---|---|---|---|
| 1 | AVARIA-SAAVEDRA, GONZALO FELIPE | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 2 | Cuadrado, Osvaldo | Hombre |
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile
Universidad Austral de Chile - Chile |
| 3 | MORENO-MARTINEZ, JOSE ALBERTO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 4 | SOTO-NORAMBUENA, LEOPOLDO ALEJANDRO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 5 | VargasBlanco, I | - | |
| 6 | HerreraVelazquez, JJE | - |