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| DOI | 10.1063/1.3079732 | ||||
| Año | 2009 | ||||
| Tipo | proceedings paper |
Citas Totales
Autores Afiliación Chile
Instituciones Chile
% Participación
Internacional
Autores
Afiliación Extranjera
Instituciones
Extranjeras
Ion beam emission in plasma focus (PF) discharges was originally investigated to explain the strong forward anisotropy observed in the neutron. Several properties of PF emitted deuteron beams have been measured, including their angular distributions and energy spectra in devices operating with energies from 1 kJ to 1 MJ. At present there is a growing interest in the development of very small PF devices operating under W. As part of the characterization program of the very low energy PF devices (< 1kJ) developed at the Chilean Nuclear Energy Commission, the charges particle emission in hydrogen (H-2) and mixture (H-2+ %Ar) are being studied. In order to obtain an estimation of the ions energy spectrum and ionization grade, by using time of flight method, a graphite collector system operating in the bias ion collector mode was constructed and it is being used. Preliminary results of the ion beams measurements in different experimental conditions, at a plasma focus device of 400 joules (PF-400J) are presented.
| Ord. | Autor | Género | Institución - País |
|---|---|---|---|
| 1 | MORENO-MARTINEZ, JOSE ALBERTO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research on Plasma Physics and Pulsed Power - Chile |
| 2 | PAVEZ-MORALES, CRISTIAN ARTURO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research on Plasma Physics and Pulsed Power - Chile |
| 3 | SOTO-NORAMBUENA, LEOPOLDO ALEJANDRO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research on Plasma Physics and Pulsed Power - Chile |
| 4 | TARIFENO-SALDIVIA, ARIEL ESTEBAN | Hombre |
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile
Universidad de Concepción - Chile Center for Research on Plasma Physics and Pulsed Power - Chile |
| 5 | Reymond, Piotr | Hombre |
Universidad de Chile - Chile
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| 6 | Verschueren, Nicolas | Hombre |
Universidad de Chile - Chile
|
| 7 | Ariza, Pablo | Hombre |
Universidad de Chile - Chile
|
| 8 | Hammer, DA | - | |
| 9 | Kusse, BR | - |
| Fuente |
|---|
| Bicentennial Program in Science and Technology |
| Center of Research and Applicatios in Plasma physics and Pulse Power Technology |
| Agradecimiento |
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| This work is supported by Bicentennial Program in Science and Technology grant ACT26, Center of Research and Applicatios in Plasma physics and Pulse Power Technology, P4. The authors thanks to H. Bhuyan and M.Favre from P. Universidad Catolica de Chile for fruithful discussions. |