Muestra métricas de impacto externas asociadas a la publicación. Para mayor detalle:
| Indexado |
|
||||
| DOI | 10.1088/1742-6596/720/1/012041 | ||||
| Año | 2016 | ||||
| Tipo | proceedings paper |
Citas Totales
Autores Afiliación Chile
Instituciones Chile
% Participación
Internacional
Autores
Afiliación Extranjera
Instituciones
Extranjeras
Spectral measurements in the visible range of the plasma sheath ionization degree evolution on the plasma focus device PF-400J are presented. The measurements were done with temporal and spatial resolution in a plasma focus device of low stored energy: PF-400J (176-539 J, 880 nF, 20-35 kV, quarter period similar to 300ns) [1]. An ICCD was attached to a 0.5 m focal length visible spectrometer, which enabled the acquisition of time resolved spectrum with 20 ns integration time throughout the whole current pulse evolution. The spatial resolution was attained using a set of lenses which allowed the focusing of a small volume of the plasma sheath in different positions of the inter-electrode space. Discharges were carried out in mixtures of Hydrogen with gases in different proportions: 5% Neon, 5% Krypton and 2% Nitrogen. Discharges using Neon as an impurity showed no ionization of the gas, just a very low intensity emission of Ne I at times much larger than the maximum current. Nitrogen, on the other hand, showed a high ionization reaching N V (N4+) at the end of the axial phase, with a distinctive evolution of the ionization degree as the plasma sheath moved towards the end of the electrodes. A mixed result was found when using Krypton, since the ionization degree only reached levels around Kr II/III even though it has an ionization potential lower than Neon.
| Ord. | Autor | Género | Institución - País |
|---|---|---|---|
| 1 | AVARIA-SAAVEDRA, GONZALO FELIPE | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 2 | Cuadrado, Osvaldo | Hombre |
Universidad Austral de Chile - Chile
|
| 3 | MORENO-MARTINEZ, JOSE ALBERTO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 4 | PAVEZ-MORALES, CRISTIAN ARTURO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 5 | SOTO-NORAMBUENA, LEOPOLDO ALEJANDRO | Hombre |
Comision Chilena de Energia Nuclear - Chile
Centro de Investigacion y Aplicaciones en Fisica de Plasmas y Tecnologias de Potencia Pulsada - Chile Center for Research and Applications in Plasma Physics and Pulsed Power - Chile |
| 6 | Gutierrez, G | - | |
| 7 | Roa, L | - |
| Fuente |
|---|
| CONICYT-PAI |
| FONDECYT Iniciación |
| CONICYT-PIA |
| Fondecyt Regular |
| Bilateral Project Chile-Argentina |