Muestra la distribución de su producción desde 2008 por disciplinas.
Publicaciones WoS (Ediciones: ISSHP, ISTP, AHCI, SSCI, SCI), Scopus, SciELO Chile.
| Institución | Center for Research and Applications in Plasma Physics and Pulsed Power |
| WOS | #Pub |
|---|---|
| Physics, Fluids & Plasmas | 17 |
| Physics, Applied | 6 |
| Physics, Nuclear | 6 |
| Physics, Multidisciplinary | 4 |
| Materials Science, Multidisciplinary | 4 |
| Instruments & Instrumentation | 3 |
| Nuclear Science & Technology | 3 |
| Nanoscience & Nanotechnology | 2 |
| Physiology | 1 |
| Biology | 1 |
| Engineering, Multidisciplinary | 1 |
| Cell Biology | 1 |
| Oncology | 1 |
| Optics | 1 |
| Scopus | #Pub |
|---|---|
| Physics And Astronomy (All) | 24 |
| Instrumentation | 2 |
| Condensed Matter Physics | 2 |
| Multidisciplinary | 1 |
| Electronic, Optical And Magnetic Materials | 1 |
| Nuclear And High Energy Physics | 1 |
| Surfaces, Coatings And Films | 1 |
| Acoustics And Ultrasonics | 1 |
| Nuclear Energy And Engineering | 1 |
| SciELO | #Pub |
|---|
| Publicaciones | Citas | ||||
|---|---|---|---|---|---|
| Total | Porcentaje | Total | Porcentaje | Representativas Cuartil (Mediana) | |
| Q1 | 5 | 22.7 % | 75 | 39.1 % | 15.5 |
| Q2 | 8 | 36.4 % | 70 | 36.5 % | 8 |
| Q3 | 5 | 22.7 % | 33 | 17.2 % | 7.5 |
| Q4 | 4 | 18.2 % | 14 | 7.3 % | 3.5 |