Muestra la distribución de la producción WoS, Scopus y SciELO del autor.
Publicaciones WoS (Ediciones: ISSHP, ISTP, AHCI, SSCI, SCI), Scopus, SciELO Chile.
Departamento Gestión de Conocimiento, Monitoreo y Prospección
Consultas o comentarios: productividad@anid.cl
Consultas o comentarios: productividad@anid.cl
| Firmas del autor | |
| Nombre | AVARIA, G. |
| Género | Hombre |
| Área Principal WOS | Physics, Fluids & Plasmas; Physics, Applied; Engineering, Electrical & Electronic; |
| Afiliación Principal | Comision Chilena De Energia Nuclear |
ORCID
|
0000-0002-1286-5162 |
Publicaciones en Chile
Citas Totales
Afiliaciones Chilenas
Periodo registrado: 2008 - 2024
| WOS | #Pub |
|---|---|
| Physics, Fluids & Plasmas | 9 |
| Physics, Applied | 5 |
| Engineering, Electrical & Electronic | 4 |
| Computer Science, Information Systems | 3 |
| Multidisciplinary Sciences | 3 |
| Physics, Multidisciplinary | 3 |
| Telecommunications | 3 |
| Physics, Condensed Matter | 2 |
| Materials Science, Multidisciplinary | 2 |
| Physics, Mathematical | 2 |
| Physics, Nuclear | 1 |
| Engineering, Multidisciplinary | 1 |
| Nanoscience & Nanotechnology | 1 |
| Nuclear Science & Technology | 1 |
| Polymer Science | 1 |
| Materials Science, Coatings & Films | 1 |
| Energy & Fuels | 1 |
| Automation & Control Systems | 1 |
| Computer Science, Artificial Intelligence | 1 |
| Instruments & Instrumentation | 1 |
| Chemistry, Physical | 1 |
| Scopus | #Pub |
|---|---|
| Physics And Astronomy (All) | 12 |
| Industrial And Manufacturing Engineering | 2 |
| Statistics And Probability | 2 |
| Condensed Matter Physics | 2 |
| Statistical And Nonlinear Physics | 2 |
| Instrumentation | 1 |
| SciELO | #Pub |
|---|
| Institución | # Pub |
|---|---|
| Comision Chilena De Energia Nuclear | 46 |
| Center For Research And Applications In Plasma Physics And Pulsed Power | 26 |
| Centro De Investigacion Y Aplicaciones En Fisica De Plasmas Y Tecnologias De Potencia Pulsada | 20 |
| Universidad Nacional Andrés Bello | 18 |
| Pontificia Universidad Católica De Chile | 5 |
| Colorado State Univ | 3 |
| Colorado State University | 3 |
| Center For Research And Applications In Plasma Physics And Pulsed Power P4 | 3 |
| Universidad Técnica Federico Santa María | 2 |
| National Science Foundation | 1 |
| Center For Research And Applications In Plasma Physics And Pulsed Power P4 Chile | 1 |
| Comisión Chilena De Enegía Nuclear | 1 |
| Comisión Chilena De Enegía Nuclear Chile | 1 |
| Com. Chilena Energia Nucl. | 1 |
| Center For Research And Applications In Plasma Physics And Pulsed Power (P4) | 1 |
| Natl Sci Fdn Erc Extreme Ultraviolet Sci & Techno | 1 |
| Universidad De Talca | 1 |
| Año | Firma | Institución (Incites asoc.) | H Index | Average Percentile | Impact Citation | Impact Relative World | Impact Journal Normalized Citation | Impact Category Normalized Citation | Percentage Cited | Percentage Top 1 | Percentage Top 10 | Percentage Journal Q1 | Percentage Journal Q2 | Percentage Journal Q3 | Percentage Journal Q4 |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| 2019 | Avaria, G. | Pontificia Universidad Catolica de Chile | 3.0 | 57.8 | 9.0 | 1.0 | 0.4 | 0.5 | 100.0 | 0.0 | 0.0 | 33.3 | 66.7 | 0.0 | 0.0 |
| 2019 | Avaria, G. | Universidad Andres Bello | 0.0 | 100.0 | 0.0 | 0.0 | 0.0 | 0.0 | 0.0 | 0.0 | 0.0 | 0.0 | 0.0 | 66.7 | 33.3 |
| 2019 | Avaria, Gonzalo | Universidad Andres Bello | 1.0 | 81.6 | 0.7 | 0.1 | 0.6 | 0.3 | 66.7 | 0.0 | 0.0 | 0.0 | 33.3 | 0.0 | 66.7 |
| 2019 | Avaria, Gonzalo | Pontificia Universidad Catolica de Chile | 1.0 | 74.8 | 4.0 | 0.4 | 0.3 | 0.2 | 100.0 | 0.0 | 0.0 | 100.0 | 0.0 | 0.0 | 0.0 |
Descargar
Descarga los datos de esta página (formato JSON).
Descargar
Descarga los datos de esta página como un archivo Excel.
